Oxides Biofilms microbiens XPS Functionalization Avalanche breakdown Mott insulators Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation Ablation laser Plasma etching Mass spectrometry A Multilayers Biomembranes Chalcogenide Optical interferometry Sputtering Residual stress Nanocomposite Applications industrielles A-CNx Bixbyite X-ray diffraction Resistive switching CHLORINE PLASMAS Atomic layer etching CaTiO3Pr^3^+ Buffer Couple NEXAFS Rutile Band alignment A1 Characterization Semiconductors Titanium dioxide Colloidal solution Transmission electron microscopy CNTs’ collapse X-ray photoelectron spectroscopy B2 Quaternary Plasmas froids Thin films CH4 Band gap TEM B Chemical synthesis Aryl-diazonium salts Amyloid precursor Transfert d'énergie Structure Integrated optics Adsorption B2 Semiconducting indium compounds AuCu alloy Carbon Nanotube Physical vapor deposition Aluminium nitride Scanning electron microscopy Biomasse Selenization Nanotubes Alzheimer's disease Films Amorphous Thin film 3 nm in size Alloying AlN Low-pressure plasma processing Non-volatile memory Calcined clay TiO2 Atomic force microscopy Sol-gel Anatase Carbon Mott insulator Bipolar resistive switching BRS Spectroscopic ellipsometry V2O3 Optical waveguides AZO thin films Vanadium Sesquioxide C Photoelectron spectroscopy Kirkendall effect Ambipolar material SF 6 B1 Inorganic compounds Annealing Copper BOMBARDMENT B2 Semiconducting alloys A3 Physical vapor deposition processes Capacitance A Chalcogenides Biocapteurs A Thin films B3 Solar cells Optical properties CIGSe Magnetron sputtering PECVD Etching